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文中通过台阶实验的数据结合光刻胶光栅掩模的槽形,得到光刻胶特性参数,利用这些参数可以模拟出任一曝光量,任一显影时间,任一空频下,光栅掩模的槽形.为今后制作符合要求的光栅提供有力依据.
Abstract：In this paper,the characteristic curve parameters of photoresist have been found,based on the experimental data of step experiment combined with trough of the photoresist grating mask. Making use of this parameters,we can simulate the trough of grating mast under arbitrary exposure,developing time and space frequency,which provides powerful gist for making the grating accorded with requirement.
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基本信息:
中图分类号:O4-33
引用信息:
[1]张洪波.光刻胶特性曲线参数测量的新方法[J].物理与工程,2010,20(04):29-32.
2010-08-15
2010-08-15